Interfacial Reaction and Migration Due to Binary Reaction Diffusion

Abstract:

Article Preview

Info:

Periodical:

Defect and Diffusion Forum (Volumes 95-98)

Edited by:

M. Koiwa, K. Hirano, H. Nakajima and T. Okada

Pages:

561-572

DOI:

10.4028/www.scientific.net/DDF.95-98.561

Citation:

M. Onishi et al., "Interfacial Reaction and Migration Due to Binary Reaction Diffusion", Defect and Diffusion Forum, Vols. 95-98, pp. 561-572, 1993

Online since:

January 1993

Export:

Price:

$35.00

In order to see related information, you need to Login.