Si Doped and Un-Doped CrN Thin Films Produced by Magnetron Sputtering: Structural and Mechanical Properties

Abstract:

Chromium nitride and silicon doped chromium nitride thin films have been deposited by r.f. reactive magnetron sputtering. The effect of processing parameters on the properties of chromium nitride films and the correspondent influence of the addition of silicon on the chromium nitride matrix in the films structure and mechanical properties have been investigated. The characterization of the coatings was performed by X-ray diffraction (XRD), and nano-indentation experiments. These studies allow analyzing the crystalline phases, crystal orientation/texture, crystallite size, mechanical properties and the relations between the characteristics of the films. The increase of the nitrogen partial pressure in the working atmosphere produces changes from a body-centered cubic (bcc) Cr structure, to hexagonal Cr₂N to face-centered cubic (fcc) CrN structure, with CrN (111) preferred orientation. For the films with a dominant Cr2N phase the hardness has a relative maximum (42 GPa). The highest hardness was measured for a coating with dominant CrN phase (45 GPa) with a crystallite size around 18 nm. The addition of Si, in the films with CrN dominant phase, maintains the CrN (111) preferred orientation and produced variable changes in films hardness, depending on deposition conditions.

• Periodical: Journal of Nano Research (Volumes 18-19)
• Pages: 201-211
• DOI: https://doi.org/10.4028/www.scientific.net/JNanoR.18-19.201
• Online since: July 2012
• Authors: L. Cunha, C. Moura
• Keywords: Chromium Nitride, Mechanical Property, Silicon Doped Chromium Nitride, Structure

References

[1] S. Veprek, S. Reiprich, A concept for the design of novel superhard coatings, Thin Solid Films 268 (1995) 64-71

DOI: 10.1016/0040-6090(95)06695-0

[2] G.-S. Kim, B.-S. Kim, S.-Y. Lee, High-speed wear behaviors of CrSiN coatings for the industrial applications of water hydraulics, Surf. Coat. Technol. 200 (2005) 1814-1818

DOI: 10.1016/j.surfcoat.2005.08.059

[3] M. Diserens, J. Patscheider, F. Lévy, Improving the properties of titanium nitride by incorporation of silicon, Surf. Coat. Technol. 108–109 (1998) 241-246

DOI: 10.1016/s0257-8972(98)00560-x

[4] S. Veprek, The search for novel, superhard materials, J. Vac. Sci. Technol. A 17 (1999) 2401-2420

[5] H.C. Barshilia, A. Jain, K.S. Rajam, Structure, hardness and thermal stability of nanolayered TiN/CrN multilayer coatings, Vacuum 72 (2003) 241-248

DOI: 10.1016/j.vacuum.2003.08.003

[6] G.A. Zhang, Z.G. Wu, M.X. Wang, X.Y. Fan, J. Wang, P.X. Yan, Structure evolution and mechanical properties enhancement of A1/A1N multilayer, Appl. Surf. Sci. 253 (2007) 8835-8840

DOI: 10.1016/j.apsusc.2007.04.039

[7] J.H. Park, W.S. Chung, Y.-R. Cho, K.H. Kim, Synthesis and mechanical properties of Cr-Si-N coatings deposited by a hybrid system of arc ion plating and sputtering techniques, Surf. Coat. Technol. 188–189 (2004) 425-430

DOI: 10.1016/j.surfcoat.2004.08.045

[8] E. Martinez, R. Sanjines, A. Karimi, J. Esteve, F. Levy, Mechanical properties of nanocomposite and multilayered Cr-Si-N sputtered thin films, Surf. Coat. Technol. 180–181 (2004) 570-574

DOI: 10.1016/j.surfcoat.2003.10.121

[9] D. Pilloud, J.F. Pierson, J. Takadoum, Structure and tribological properties of reactively sputtered Zr-Si-N films, Thin Solid Films 496 (2006) 445-449

DOI: 10.1016/j.tsf.2005.09.062

[10] Y.S. Dong, Y. Liu, J.W. Dai, G.Y. Li, Superhard Nb-Si-N composite films synthesized by reactive magnetron sputtering, Appl. Surf. Sci. 252 (2006) 5215-5219

DOI: 10.1016/j.apsusc.2005.08.007

[11] Q. Liu, Q.F. Fang, F.J. Liang, J.X. Wang, J.F. Yang, C. Li, Synthesis and properties of nanocomposite MoSiN hard films, Surf. Coat. Technol. 201 (2006) 1894-1898

DOI: 10.1016/j.surfcoat.2005.12.046

[12] E. Martinez, R. Sanjinés, O. Banakh, F. Lévy, Electrical, optical and mechanical properties of sputtered CrNy and Cr1-xSixN1.02 thin films, Thin Solid Films 447–448 (2004) 332-336

DOI: 10.1016/s0040-6090(03)01113-1

[13] H.Y. Lee, W.S. Jung, J.G. Han, S.M. Seo, J.H. Kim, Y.H. Bae, The synthesis of CrSiN film deposited using magnetron sputtering system, Surface & Coatings Technology 200 (2005) 1026-1030

DOI: 10.1016/j.surfcoat.2005.02.006

[14] G. Zhang, L. Wang, S.C. Wang, P. Yan, Q. Xue, Structure and mechanical properties of reactive sputtering CrSiN films, Applied Surface Science 255 (2009) 4425-4429

DOI: 10.1016/j.apsusc.2008.11.036

[15] D. Mercs, N. Bonasso, S. Naamane, Jean-Michel Bordes, C. Coddet, Mechanical and tribological properties of Cr-N and Cr-SI-N coatings reactively sputter deposited, Surf. Coat. Technol. 200 (2005) 403-407

DOI: 10.1016/j.surfcoat.2005.02.214

[16] D. Mercs, P. Briois, V. Demange, S. Lamy, C. Coddet, Influence of the addition of silicon on the structure and properties of chromium nitride coatings deposited by reactive magnetron sputtering assisted by RF plasmas, Surf. Coat. Technol. 201 (2007) 6970-6976

DOI: 10.1016/j.surfcoat.2006.12.028

[17] T. H. Dekeijser, J.I. Langford, E.F. Mittemeijer, A.B.P. Vogels, Use of the Voigt function in a single-line method for analysis of X-ray-diffraction line broadening, J. Appl. Crystallogr. 15 (1982) 308-314

DOI: 10.1107/s0021889882012035

[18] W.C. Oliver, G.M. Pharr, An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments, J. Mater. Res. 7 (1992) 1564-1583

DOI: 10.1557/jmr.1992.1564

[19] A. Barata, L. Cunha, C. Moura, Characterisation of chromium nitride films produced by PVD techniques, Thin Solid Films 398 –399 (2001) 501

DOI: 10.1016/s0040-6090(01)01498-5

[20] M. Pakala, R.Y. Lin, Reactive sputter deposition of chromium nitride coatings, Surf. Coat. Technol. 81 (1996) 233-239

DOI: 10.1016/0257-8972(95)02488-3