Effect of Annealing in Atomic Hydrogen or Nitrogen Atmospheres on SiO_x Nanoclusters Obtained by HFCVD

Abstract:

SiOx nanoclusters were obtained by Hot Filament Chemical Vapor Deposition using a quartz solid source and atomic hydrogen. The nanoclusters were characterized by Photoluminescence, Atomic Force Microscopy, Energy Dispersive Analysis X-ray and Fourier Transform Infrared Spectroscopy. FTIR and EDS characterization clearly show that the material is non stoichiometric silicon oxide with a composition that depends on the growth parameters, such as source-substrate distance and time of growth. Nanoclusters of SiOx presented photoluminescence with two principal peaks at around 859 and 920 nm. Photoluminescence intensity was enhanced when samples were annealed in hydrogen atmosphere and quenched when they were annealed in nitrogen atmosphere. However, it was observed that the same samples annealed once more with the initial atomic hydrogen conditions showed an increase in photoluminescence. From these results we suppose the photoluminescence produced in this material is influenced by deep level transitions associated with dangling bonds passivated with hydrogen on the surface of the Si crystallites embedded within SiOx nanoclusters.

• Periodical: Journal of Nano Research (Volume 5)
• Pages: 105-111
• DOI: https://doi.org/10.4028/www.scientific.net/JNanoR.5.105
• Online since: February 2009
• Authors: G. García-Salgado, T. Díaz-Becerril, A. Coyopol, E. Rosendo-Andrés, H. Juárez, J. Carrillo, A.I. Oliva
• Keywords: Atomic Force Microscope (AFM), FT-IR, HFCVD, Photoluminescence (PL), SiO_x Nanoclusters

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