[1]
G. G. Harman, and L. W. Charles, Materials Problems Affecting Reliability and Yield of Wire Bonding in VLSI Devices, in MRS Proceedings, Vol. 154, Cambridge University Press, 1989, p.401.
DOI: 10.1557/proc-154-401
Google Scholar
[2]
S. Jacques, R. Leroy, M. Lethiecq, Impact of aluminum wire and ribbon bonding technologies on D2PAK package reliability during thermal cycling applications, in Microelectronics Reliability, vol. 55(9), pp.1821-1825, Aug. 2015.
DOI: 10.1016/j.microrel.2015.06.012
Google Scholar
[3]
J. Ling, T. Xu, C. Luechinger, Large Cu Wire Wedge Bonding Process for Power Devices, in 13th Electronics Packaging Technology Conference, 2011, pp.1-5.
DOI: 10.1109/eptc.2011.6184375
Google Scholar
[4]
N. Marenco, M. Kontek, W. Reinert, J. Lingner, and M.-H. Poech, Copper Ribbon Bonding for Power Electronics Applications, in Microelectronics Packaging Conference (EMPC 2013), Grenoble, France, 9-12 Sep. 2013.
Google Scholar
[5]
M. Benedikt,T. Krebs,M .Schäfer,W. Schmitt,A. Hinrich, A. Klein, A. Brand,and M. Bleifus, "Carrier and Clip each having sinterable, solidified paste for connection to a semiconductor element, corresponding sintering paste, and corresponding production method and use", Assignee: Heraeus Co., Germany, US Patent 10,347,56B2, Jul.9,2019.
Google Scholar
[6]
D.Siepe and R.Bayerer, "Semiconductor module arrangement ", Assignee: Infineon Technologies Co., Germany, US Patent 8,164,176B2, Apr.24,2012.
Google Scholar
[7]
L. Lu, Y. Shen, X. Chen, L. Qian, and K. Lu, 'Ultrahigh strength and high electrical conductivity in copper', Science (1979), vol. 304, no. 5669, p.422–426, 2004.
DOI: 10.1126/science.1092905
Google Scholar
[8]
T.H. Chuang, P.C. Wu, and Y.C. Lin, 'Lattice buffer effect of Ti film on the epitaxial growth of Ag nanotwins on Si substrates with various orientations', Materials Characterization, 167, p.110509, 2020.
DOI: 10.1016/j.matchar.2020.110509
Google Scholar
[9]
T. H. Chuang, Y. H. Chen, and P. C. Wu, "Mechanism of the Evaporation of Ag Nanotwinned Films on Si Wafers with Assistance of Ion Beam Bombardment", Int. J. Mining, Mater. and Metall. Eng., vol. 8, pp.8-15, 2022.
DOI: 10.11159/ijmmme.2022.002
Google Scholar
[10]
Z.-H. Yang, Y.-T. Chen, and T.-H. Chuang, "Growth of Cu nanotwinned films on surface activated SiC chips," Journal of Materials Science: Materials in Electronics, vol. 34, no. 23, p.1677, 2023.
DOI: 10.1007/s10854-023-11058-6
Google Scholar
[11]
D. I. Syafei, M.-T. Chiang, and T.-H. Chuang, "Formation of Cu Nanotwins on Silicon CarbideWafers with Cr Adhesive Layer under Various Substrate Bias," Metals, vol. 13, no. 10, p.1747, 2023.
DOI: 10.3390/met13101747
Google Scholar
[12]
P.Maruschak, I. Konovalenko, and A. Sorochak, "Methods for evaluating fracture patterns of polycrystalline materials based on the parameter analysis of ductile separation dimples: A review", Enginnering Failure Analysis, vol. 153, p.107587, 2023.
DOI: 10.1016/j.engfailanal.2023.107587
Google Scholar