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HomeKey Engineering MaterialsKey Engineering Materials Vols. 159-160Formation of Magnesium Oxide Thin Films by...

Formation of Magnesium Oxide Thin Films by Reactive Sputtering

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Novel Synthesis and Processing of Ceramics

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Periodical:

Key Engineering Materials (Volumes 159-160)

Pages:

299-304

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.159-160.299

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Online since:

May 1998

Authors:

K. Irie, Shoji Ishibashi, Toshiyuki Nishimura, Hidetoshi Fujii, S. Muraji, Y. Shima, H. Hasuyama

Keywords:

Fast Atom Beam, MgO, PDP, Reactive Sputtering, X-Ray Photoelectron Spectroscopy (XPS)

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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