Control and Manipulation of Residual Gases during RF Magnetron Sputter Deposition of Calcium Phosphate Coatings

Abstract:

Article Preview

Info:

Periodical:

Key Engineering Materials (Volumes 192-195)

Main Theme:

Edited by:

S. Giannini and A. Moroni

Pages:

255-258

DOI:

10.4028/www.scientific.net/KEM.192-195.255

Citation:

E.R. Love et al., "Control and Manipulation of Residual Gases during RF Magnetron Sputter Deposition of Calcium Phosphate Coatings", Key Engineering Materials, Vols. 192-195, pp. 255-258, 2001

Online since:

September 2000

Export:

Price:

$35.00

In order to see related information, you need to Login.