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HomeKey Engineering MaterialsKey Engineering Materials Vols. 206-213Remote Microwave Plasma Enhanced Chemical Vapor...

Remote Microwave Plasma Enhanced Chemical Vapor Deposition (RMPECVD) of Silica and Alumina Films

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Euro Ceramics VII

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Periodical:

Key Engineering Materials (Volumes 206-213)

Pages:

559-562

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.206-213.559

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Online since:

December 2001

Authors:

Jean Desmaison, H. Hidalgo, P. Tristant, F. Naudin, D. Merle

Keywords:

Aluminum (Al), Oxide, PECVD, Silica

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© 2002 Trans Tech Publications Ltd. All Rights Reserved

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