Remote Microwave Plasma Enhanced Chemical Vapor Deposition (RMPECVD) of Silica and Alumina Films

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Periodical:

Key Engineering Materials (Volumes 206-213)

Main Theme:

Edited by:

C. Kermel, V. Lardot, D. Libert and I. Urbain

Pages:

559-562

DOI:

10.4028/www.scientific.net/KEM.206-213.559

Citation:

J. Desmaison et al., "Remote Microwave Plasma Enhanced Chemical Vapor Deposition (RMPECVD) of Silica and Alumina Films", Key Engineering Materials, Vols. 206-213, pp. 559-562, 2002

Online since:

December 2001

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$35.00

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