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HomeKey Engineering MaterialsKey Engineering Materials Vols. 238-239A Study of the Fabrication of Multi-Layer...

A Study of the Fabrication of Multi-Layer Microstructures Using ELID Grinding and the Thick Photoresist Lithography Technology

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Advances in Abrasive Technology V

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Periodical:

Key Engineering Materials (Volumes 238-239)

Pages:

19-22

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.238-239.19

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Online since:

April 2003

Authors:

J.W. Kim, Yutaka Yamagata, Shinya MORITA, Sei Moriyasu, Hitoshi Ohmori, Takehiro Higuchi

Keywords:

Complex Micro-Structures, Electroplating, ELID (ELectrolytic In-Process Dressing) Grinding, Micro-Electromechanical System (MEMS), SU-8, Thick Photoresist Lithography

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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Citation:

[1] J.W. Kim et al., Advances in Abrasive technology IV (2000) pp.115-118.

[2] Yamagata, Y et al. Proc. of EUSPEN, Bremen, (1999) pp.132-134.