Approach of Realizing Material Removal at Nanometer Level in Ultraprecision Polishing

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Periodical:

Key Engineering Materials (Volumes 259-260)

Edited by:

Xipeng Xu

Pages:

466-470

Citation:

X. Shen et al., "Approach of Realizing Material Removal at Nanometer Level in Ultraprecision Polishing ", Key Engineering Materials, Vols. 259-260, pp. 466-470, 2004

Online since:

March 2004

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[1] J.L. Yuan: Ultraprecision Machining Technology of Functional Ceramics (Harbin Institute of Technology Press, China 2000).

[2] J.L. Yuan, B. Lin, et al: Key Engineering Materials Vols. 202-203 (2001), p.85.

[3] J.L. Yuan, B. Lin, et al: Key Engineering Materials Vols. 202-203 (2001), p.235.

[4] J.L. Yuan, T. Kasai and A. Kobayashi: Proceedings of the 4th SJSUPM (Tokyo, Japan 1992).

[5] U. Heusek and J. Avroutine: Ann. CIRP Vol. 50 (2001), p.229.

[6] Q.D. Wang, M.C. Liu and H.X. Zhang: Optical Technique Vol. 26 (2000), p.105.

[7] J.X. Yi and Y.B. Hou: Intelligent Control Technique (Beijing University of Technology Press, China 1999).