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HomeKey Engineering MaterialsKey Engineering Materials Vols. 264-268Pb(Zr0.52Ti0.48)O3 Films on Stainless Steel by...

Pb(Zr_0.52Ti_0.48)O₃ Films on Stainless Steel by Chemical Solution Deposition

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Euro Ceramics VIII

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Periodical:

Key Engineering Materials (Volumes 264-268)

Pages:

1217-1220

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.264-268.1217

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Online since:

May 2004

Authors:

M. Özenbaş, A. Yıldırım

Keywords:

Chemical Solution Deposition, PZT, Stainless Steel Substrate, Thin Film

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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[1] Q. Zou, H.E. Ruda and B.G. Yacobi: Appl. Phys. Lett. Vol. 78 (2001), p.1282.

[2] T. Maeder, P. Muralt, L. Sagalowicz, I. Reaney, M. Kohli, A. Kholkin and N. Setter: Appl. Phys. Lett. Vol. 68 (1996), p.776.

DOI: 10.1063/1.116529

[3] G.J.M. Dormans, J.H.H.M. Kemperman, R.A.M. Wolters, P.J. van Veldhoven, M.S. de Keijser, R.B.F. Janssen, M.J.E. Ulenaers and P.K. Larsen: Microelectron. Eng. Vol. 29 (1995), p.33.

DOI: 10.1016/0167-9317(95)00110-7

[4] K. Saegusa: Jpn. J. Appl. Phys. Vol. 36, Pt. 1 (1997), p.6888.

[5] K. Li, H.L.W. Chan, K.W. Lee and C.L. Choy: Integ. Ferroelectrics Vol. 30 (2000), p.253.

[6] G. Yi, Z. Wu and M. Sayer: J. Appl. Phys. Vol. 64 (1988), p.2717.

[7] C.K. Kwok and S.B. Desu: Appl. Phys. Lett. Vol. 60 (1992), p.1430.

[8] A.C. Rastogi, S.R. Darvish and P.K. Bhatnagar: Mater. Chem. Phys. Vol. 73 (2002).