Nondestructive and Destructive Characterization of Nano-Structured Multilayer

Tae Geun Kim; Seung Yoon Lee; In Yong Kang; Yong Chae Chung; Jin Ho Ahn

doi:10.4028/www.scientific.net/KEM.270-273.849

Paper Titles

Metallic Multilayer Sputtering on Polycarbonate for EMI Shielding
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Ultrasonic Measurement of a Small Deformation of Hard Disk Drive Suspension
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Application of the ESPI Method for Thermal Friction Noise in Rear Cover of TV
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Interfacial Stresses in Viscoelastic Thin Layer due to Moisture Absorption
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Nondestructive and Destructive Characterization of Nano-Structured Multilayer
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Measurement of Monodisperse Particle Charge in DC Plasma
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Design of Vertical Type Thermal CVD Reactor with Rotating-Disk for New Generation Semiconductor Processes
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Fabrication of Nano-Structure by STM Tip Induced Atomic Diffusion
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Characterization of Heating Elements with Cobalt Silicide Films for Inkjet Printer
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Nondestructive and Destructive Characterization of Nano-Structured Multilayer

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Periodical:

Key Engineering Materials (Volumes 270-273)

Pages:

849-854

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.270-273.849

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Online since:

August 2004

Authors:

Tae Geun Kim, Seung Yoon Lee, In Yong Kang, Yong Chae Chung, Jin Ho Ahn

Keywords:

EUVL, Mo/Si, Multilayer, Reflectivity, TEM, X-Ray Diffraction (XRD)

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