Effect of Ion-Implantation on the Microstructure of Si3N4 Based Ceramics

Abstract:

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Si3N4 based ceramics that made by hot isostatic press, were implanted at room temperature with N+ - and C+ - ions with energy of 500 keV and 2 MeV, respectively. The specimens were irradiated at a fluence of 1017 ion/cm2. The microstructure changes after ionimplantation in the surface layer were investigated by transmission electron microscopy (TEM). The effect of ion-implantation on the tribological properties was also studied. After N+ and C+ ionimplantation an amorphous layer near to the surface has been formed which was observed by electron diffraction measurement. The wear tests were performed by means of a ball-on-disk configuration using commercially available Si3N4 ball. The friction coefficient was measured online, the wear coefficient was determined on the base of the wear scar sizes. The specific wear rate was reduced by N+-implantation and the coefficient of friction was lower in the initial stage in both cases.

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Periodical:

Edited by:

J. Dusza, R. Danzer and R. Morrell

Pages:

234-237

DOI:

10.4028/www.scientific.net/KEM.290.234

Citation:

J.K. Babcsán et al., "Effect of Ion-Implantation on the Microstructure of Si3N4 Based Ceramics", Key Engineering Materials, Vol. 290, pp. 234-237, 2005

Online since:

July 2005

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$35.00

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