Reflection Intensity Measurement for Dielectric Material Using a Microwave Single Probe and Its Electromagnetic Field Analysis

Hirofumi Kakemoto; Satoshi Wada; Takaaki Tsurumi

doi:10.4028/www.scientific.net/KEM.301.125

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Measurements of Microwave Dielectric Property of Dielectric Thin Layers Using Micro-Sized Planar Electrodes
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Reflection Intensity Measurement for Dielectric Material Using a Microwave Single Probe and Its Electromagnetic Field Analysis
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Dielectric Spectra of BaTiO₃-Based Ceramics Measured by Impedance Analyzer Using Micro Planar Electrodes
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HomeKey Engineering MaterialsKey Engineering Materials Vol. 301Reflection Intensity Measurement for Dielectric...

Reflection Intensity Measurement for Dielectric Material Using a Microwave Single Probe and Its Electromagnetic Field Analysis

Abstract:

Microwave reflection intensity for microwave absorber, Cu-plate and Al2O3 (0001) single crystal substrate was measured from 8GHz to11GHz as a function of distance between single probe and sample at room temperature. The minimum reflection intensity was observed in the distance of 0.2mm between single probe and sample at 9.4GHz, although the reflection intensity was decreased with increasing distance in other measurement frequencies. The electromagnetic field analysis was hence carried out for simulation model that is defined with coaxial cable, probe and sample using finite differential time domain method. The reflection coefficient and impedance for simulation model were calculated, and compared to the experimental data. From results of electromagnetic analysis, the minimum point of reflection intensity was caused from an impedance matching.

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Periodical:

Key Engineering Materials (Volume 301)

Pages:

125-128

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.301.125

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Online since:

January 2006

Authors:

Hirofumi Kakemoto, Satoshi Wada, Takaaki Tsurumi

Keywords:

Al₂O₃, Impedance Matching, Micro-Wave, Reflection Intensity, Single Probe

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DOI: 10.1063/1.125270

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