Preparation of Mesoporous Silicate Thick Films by Electrophoretic Deposition and Their Adsorption Properties of Water Vapor

Hideyuki Negishi; Akira Endo; Masaru Nakaiwa; Hiroshi Yanagishita

doi:10.4028/www.scientific.net/KEM.314.147

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Electrophoretic Deposition of Carbon Nanotubes on Metallic Surfaces
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Preparation of Mesoporous Silicate Thick Films by Electrophoretic Deposition and Their Adsorption Properties of Water Vapor
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HomeKey Engineering MaterialsKey Engineering Materials Vol. 314Preparation of Mesoporous Silicate Thick Films by...

Preparation of Mesoporous Silicate Thick Films by Electrophoretic Deposition and Their Adsorption Properties of Water Vapor

Abstract:

Ordered mesoporous silicate (MPS) is one of the most promising adsorbents for energy-efficient adsorption systems such as desiccant cooling systems, because it can be recovered by low-temperature exhaust heat at less than 100 °C. The electrophoretic deposition (EPD) technique was investigated for the fabrication of a thick film. A particle/acetone suspension could be applied and the dispersed particles become negatively charged. A MPS powder can be deposited by EPD at 50 V for 10 min onto 15.7 cm2 of a tubular metal substrate and more than a 200 μm thick uniform coating was obtained. After heat treatment at 300 °C, the MPS powder can be fixed on the substrate without the addition of binders. The obtained thick film of MPS possessed the same porous structure and properties regarding the adsorption of water vapor showed almost the same as that of the powder sample.

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Periodical:

Key Engineering Materials (Volume 314)

Pages:

147-152

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.314.147

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Online since:

July 2006

Authors:

Hideyuki Negishi, Akira Endo, Masaru Nakaiwa, Hiroshi Yanagishita

Keywords:

Electrophoretic Deposition (EPD), Mesoporous Silicate, Thick Film, Water Vapor

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