Fabrication of Nanoscale Gratings by Nanoimprint on Silicon Wafer
This paper presents an approach to fabricate nanoscale gratings by direct imprint on silicon substrate. Imprint conditions that affect the transcription accuracy, such as imprint temperature and pressure, are discussed, and the profile of the imprinted 80nm width gratings with a 250 nm pitch is checked by SEM. High fidelity and fine uniformity demonstrate that nanoimprint is an economical and efficient method to fabricate nanoscale gratings.
Zhejun Yuan, Xipeng Xu, Dunwen Zuo, Julong Yuan and Yingxue Yao
X.Q. Fan et al., "Fabrication of Nanoscale Gratings by Nanoimprint on Silicon Wafer", Key Engineering Materials, Vols. 315-316, pp. 825-828, 2006