Fabrication of Nanoscale Gratings by Nanoimprint on Silicon Wafer

X.Q. Fan; H.H. Zhang; S. Liu; K. Jia; Z.Y. Gan

doi:10.4028/www.scientific.net/KEM.315-316.825

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 315-316Fabrication of Nanoscale Gratings by Nanoimprint...

Fabrication of Nanoscale Gratings by Nanoimprint on Silicon Wafer

Abstract:

This paper presents an approach to fabricate nanoscale gratings by direct imprint on silicon substrate. Imprint conditions that affect the transcription accuracy, such as imprint temperature and pressure, are discussed, and the profile of the imprinted 80nm width gratings with a 250 nm pitch is checked by SEM. High fidelity and fine uniformity demonstrate that nanoimprint is an economical and efficient method to fabricate nanoscale gratings.

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Periodical:

Key Engineering Materials (Volumes 315-316)

Pages:

825-828

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.315-316.825

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Online since:

July 2006

Authors:

X.Q. Fan, H.H. Zhang, S. Liu, K. Jia, Z.Y. Gan

Keywords:

Grating, Imprint, Nanoscale

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References

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