Growth of Highly Oriented Zinc Oxide Thin Films by Plasma Enhanced Chemical Vapor Deposition

Abstract:

Article Preview

In the paper, zinc oxide (ZnO) thin films are deposited by plasma enhanced chemical vapor deposition (PECVD) at different substrate temperatures. The ZnO films are characterized by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The analysis results indicate that highly crystalline films with high orientation can be obtained at a substrate temperature of 300 oC with 50 ml/min flow rate from Diethylzinc (DEZ). Furthermore, the investigation of optical property shows that ZnO films are transparent, and the peak transmittance in the visible region is as high as 85%.

Info:

Periodical:

Key Engineering Materials (Volumes 321-323)

Edited by:

Seung-Seok Lee, Joon Hyun Lee, Ik Keun Park, Sung-Jin Song, Man Yong Choi

Pages:

1687-1690

DOI:

10.4028/www.scientific.net/KEM.321-323.1687

Citation:

H. J. Kim et al., "Growth of Highly Oriented Zinc Oxide Thin Films by Plasma Enhanced Chemical Vapor Deposition", Key Engineering Materials, Vols. 321-323, pp. 1687-1690, 2006

Online since:

October 2006

Export:

Price:

$38.00

[1] Baoyou Geng, Synthesis, characterization and optical properties of regularly shaped, single-crystalline sisal-like ZnO nanostructures, Materials Letters, 59 (2005), p.3572.

DOI: 10.1016/j.matlet.2005.06.030

[2] T. Schuler, Influence of structure zone model parameters on the electrical properties of ZnO: Al sol-gel coatings, Thin Solid Films, In Press, (2005).

DOI: 10.1016/j.tsf.2005.07.246

[3] Umar, S. Lee, Star-shaped ZnO nanostructures on silicon by cyclic feeding chemical vapor deposition, Journal of Crystal Growth, 277 (2005), p.479.

DOI: 10.1016/j.jcrysgro.2005.02.007

[4] W.J. Jeong and S.K. Kim, Preparation and characteristic of ZnO thin film with high and low resistivity for an application of solar cell, Thin Solid Films, In Press, (2005).

DOI: 10.1016/j.tsf.2005.08.213

[5] Baoyou Geng, Synthesis, characterization and optical properties of regularly shaped, single-crystalline sisal-like ZnO nanostructures, Materials Letters 59 (2005), p.3572.

DOI: 10.1016/j.matlet.2005.06.030

[6] S. Lee, Star-shaped ZnO nanostructures on silicon by cyclic feeding chemical vapor deposition, Journal of Crystal Growth, 277 (2005), p.479.

DOI: 10.1016/j.jcrysgro.2005.02.007

[7] Fugang Chen, Fabrication of p-type ZnO thin films via MOCVD method by using phosphorus as dopant source, Journal of Crystal Growth, 281 (2005), p.458.

DOI: 10.1016/j.jcrysgro.2005.04.041

[8] Seung Yeop Myong and Koeng Su Lim, Provement of electrical and optical properties of ZnO thin films prepared by MOCVD using UV light irradiation and in situ H2 post-treatment, Solar Energy Materials and Solar Cells, 86 (2005), p.105.

DOI: 10.1016/j.solmat.2004.06.005

In order to see related information, you need to Login.