Influence of Ultrasound Power on the Formation of Submicron Etch Pits during Sonoelectrochemical Etching of Aluminum
Ultrasound was superimposed during electrochemical etching of aluminum and the effect of ultrasonic power on the formation and growth of etch pits were analyzed with the measurement of fast potential transient and morphology study. Ultrasound contributed the increase of etch pit density by prohibiting anodic oxide film formation and induced uniform tunnel length distribution. Current step reduction experiments indicated the enhanced mass transfer both inside tunnel and bulk solution with the increase of ultrasonic power. The capacitance of etched foil was increased by 40% with 600W of 28 KHz ultrasonic power.
Soon-Bok Lee and Yun-Jae Kim
J. W. Kang, E. S. Ko, J. K. Lee, Y. S. Tak, "Influence of Ultrasound Power on the Formation of Submicron Etch Pits during Sonoelectrochemical Etching of Aluminum", Key Engineering Materials, Vols. 326-328, pp. 433-436, 2006