Preparation of CaBi4Ti4O15 Based Thick Films on Si Substrates by Screen Printing
CaBi4Ti4O15 based thick films were prepared by screen-printing method on Si substrates. Screen-printable pastes were prepared by kneading the CaBi4Ti4O15 powder in a three-roll mill with an organic vehicle. The remanent polarization of 6.3 C/cm2 and coercive field of 130kV/cm were obtained for the CaBi4Ti4O15 with Nb2O5 1wt% thick film fired at 1130°C. The cavity structure was prepared by etching of Si substrate. The displacement-electric field butterfly curves were obtained.
Tadashi Takenaka, Hajime Haneda, Kazumi Kato, Masasuke Takata and Kazuo Shinozaki
T. Kakuda et al., "Preparation of CaBi4Ti4O15 Based Thick Films on Si Substrates by Screen Printing", Key Engineering Materials, Vols. 421-422, pp. 50-53, 2010