Boron-Doped Nanocrystalline Diamond Films Deposited By Using DC Arc Plasma Jet CVD

Bing Kun Xiang; Dun Wen Zuo; Xiang Feng Li; Feng Xu; M. Wang

doi:10.4028/www.scientific.net/KEM.426-427.30

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 426-427Boron-Doped Nanocrystalline Diamond Films...

Boron-Doped Nanocrystalline Diamond Films Deposited By Using DC Arc Plasma Jet CVD

Abstract:

Boron-doped micro-nanocrystalline diamond coating may be successfully prepared on Mo substrate with DC arc plasmas jet deposition device. Along with the increase of doped-boron concentration in the film, two-point resistance measurement indicates that film resistance presents exponential decrease; Raman spectrum test shows that, the characteristic peak value of diamond 1332cm-1 in the spectrum moves toward low frequency, the semi-height width of diamond peak, peak D and peak G, etc. in the spectrum is expanded, and the component of non-diamond bonds such as sp2, etc. in the film is increased; SEM and AFM observation shows that, increasing the doped-boron concentration could further subdivide the crystal grains in the film, and is beneficial for the growth of nano- or ultra-nano-crystalline diamond film; film annealing test shows that, micro-nanocrystalline diamond film with higher doped-boron concentration has better thermal stability than the micro-nanocrystalline diamond film without doped boron.

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Periodical:

Key Engineering Materials (Volumes 426-427)

Pages:

30-34

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.426-427.30

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Online since:

January 2010

Authors:

Bing Kun Xiang, Dun Wen Zuo, Xiang Feng Li, Feng Xu, M. Wang

Keywords:

Boron-Doped , DC Arc Plasma Jet CVD, Nanocrystalline Diamond, Thermal Stability

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