Effect of the Internal Stress of Polished Thick Diamond Film on the Infrared Transmittance at Different Temperature

Rong Fa Chen; Zhao Xia Shen; Liang Gang Dai; Xian Liang Zhang; Rui Zhu; Dun Wen Zuo

doi:10.4028/www.scientific.net/KEM.431-432.401

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 431-432Effect of the Internal Stress of Polished Thick...

Effect of the Internal Stress of Polished Thick Diamond Film on the Infrared Transmittance at Different Temperature

Abstract:

The optical-grade diamond film was prepared by DC plasma jet CVD method, and a double-sided polishing was made by EDM and mechanical polishing technology. The investigations of the internal stress at different temperature on the infrared transmission were tested in detail. SEM and AFM were used to study the polished surface morphology, surface roughness was 0.12nm and 0.25nm. XRD and Raman were characterized on the diamond films, the results showed a higher intrinsic quality. The internal stress distribution and infrared transmittance were investigated at 25°C and 100°C temperature respectively. The infrared transmission mechanism of diamond film was also discussed. The main reason of decreasing of infrared transmittance was the increasing grain collisions, which caused more scattering and absorption of incident light with temperature increasing.

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Periodical:

Key Engineering Materials (Volumes 431-432)

Pages:

401-404

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.431-432.401

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Online since:

March 2010

Authors:

Rong Fa Chen, Zhao Xia Shen, Liang Gang Dai, Xian Liang Zhang, Rui Zhu, Dun Wen Zuo

Keywords:

Infrared Transmittance, Internal Stress, Optical-Grade CVD Diamond Film

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