A Comparison of Dry and Underwater Laser Micromachining of Silicon Substrates

Viboon Saetang; Jun Wang; Philip Mathew

doi:10.4028/www.scientific.net/KEM.443.693

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 443A Comparison of Dry and Underwater Laser...

A Comparison of Dry and Underwater Laser Micromachining of Silicon Substrates

Abstract:

Laser micromachining has been widely used for decades to fabricate the micro- and submicro-component structures. However, thermal and physical damages are crucial issues associated with the process. Underwater laser ablation has been developed as a damage-free micro-ablation technique. In this paper, a comparison of the conventional dry and underwater laser micromachining of silicon is presented. It shows that the heat affected zone (HAZ) can be reduced significantly in the underwater laser process, though the material removal rate is reduced due to the energy loss by the water layer. The effects of pulse frequency, traverse speed and laser energy on the obtained kerf width, HAZ and cut surface quality are also analyzed and discussed.

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Periodical:

Key Engineering Materials (Volume 443)

Pages:

693-698

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.443.693

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Online since:

June 2010

Authors:

Viboon Saetang, Jun Wang, Philip Mathew

Keywords:

Heat Affected Zone (HAZ), Laser Micromachining, Silicon, Surface Morphology, Underwater

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