On-Line Monitoring of Run-to-Run Control Performance in a Discrete Microelectronics Manufacturing
Semiconductor manufacturing is challenged by strategy development for ensuring the yield of defect-free products. In this paper, an on-line performance assessment strategy is proposed to evaluate the EWMA-based run-to-run (RtR) controllers in a discrete microelectronics fabrication. Expressions of minimum variance performance (MVP) and best achievable performance (BAP) are derived in a rigorous way. Technologies such as close loop identification and numerical optimization are employed in order to carry out on-line monitoring. Case studies of the chemical mechanical polishing (CMP) unit operation show the efficacy and the attractiveness the strategy.
Long Chen, Yongkang Zhang, Aixing Feng, Zhenying Xu, Boquan Li and Han Shen
L. Chen "On-Line Monitoring of Run-to-Run Control Performance in a Discrete Microelectronics Manufacturing", Key Engineering Materials, Vol. 464, pp. 133-137, 2011