On-Line Monitoring of Run-to-Run Control Performance in a Discrete Microelectronics Manufacturing

Abstract:

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Semiconductor manufacturing is challenged by strategy development for ensuring the yield of defect-free products. In this paper, an on-line performance assessment strategy is proposed to evaluate the EWMA-based run-to-run (RtR) controllers in a discrete microelectronics fabrication. Expressions of minimum variance performance (MVP) and best achievable performance (BAP) are derived in a rigorous way. Technologies such as close loop identification and numerical optimization are employed in order to carry out on-line monitoring. Case studies of the chemical mechanical polishing (CMP) unit operation show the efficacy and the attractiveness the strategy.

Info:

Periodical:

Edited by:

Long Chen, Yongkang Zhang, Aixing Feng, Zhenying Xu, Boquan Li and Han Shen

Pages:

133-137

DOI:

10.4028/www.scientific.net/KEM.464.133

Citation:

L. Chen "On-Line Monitoring of Run-to-Run Control Performance in a Discrete Microelectronics Manufacturing", Key Engineering Materials, Vol. 464, pp. 133-137, 2011

Online since:

January 2011

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$35.00

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