On-Line Monitoring of Run-to-Run Control Performance in a Discrete Microelectronics Manufacturing

Abstract:

Semiconductor manufacturing is challenged by strategy development for ensuring the yield of defect-free products. In this paper, an on-line performance assessment strategy is proposed to evaluate the EWMA-based run-to-run (RtR) controllers in a discrete microelectronics fabrication. Expressions of minimum variance performance (MVP) and best achievable performance (BAP) are derived in a rigorous way. Technologies such as close loop identification and numerical optimization are employed in order to carry out on-line monitoring. Case studies of the chemical mechanical polishing (CMP) unit operation show the efficacy and the attractiveness the strategy.

• Periodical: Key Engineering Materials (Volume 464)
• Pages: 133-137
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.464.133
• Online since: January 2011
• Authors: Liang Chen
• Keywords: Control-Loop Performance Assessment, EWMA Controller, Run-to-Run Control, Semiconductor Manufacturing

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