Effects of Direct Current and Pulse Electrodeposition Parameters on the Properties of Nano Cobalt Coatings

Saeed Reza Allahkaram; N. Towhid; M. Siadat Cheraghi

doi:10.4028/www.scientific.net/KEM.471-472.1010

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Effects of Direct Current and Pulse Electrodeposition Parameters on the Properties of Nano Cobalt Coatings

Abstract:

The aim of this study was to investigate the effects of direct current (DC) and pulse current (PC) parameters on the properties of cobalt (Co) coatings electrodeposited from a chloride acidic bath. The effects of peak current density, frequency and duty cycle on the surface morphology, crystal size, thickness, current efficiency, and preferred orientation of the deposits were investigated by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The experimental thickness of the deposit was lower for pulse plating compared to that of DC plating. The current efficiency was comparatively higher for pulse plating. Less porosity and fine grains were formed by pulse plating. From XRD analysis, the calculated grain sizes of nano and micro Co coatings were around 65nm and 430nm, respectively. The results showed that, with an increase in duty cycle, grain sizes would increase, too. As pulse frequency was increased to 50Hz, grain sizes would also decrease. However, at higher frequencies, grain sizes would increase again.