Study on the Modification of TiN and CrN Binary Films

Abstract:

With the development of modern science and technology, the elements such as Al, Si, Mo, C, B will be doped into the TiN and CrN binary films to improve their properties. In this work, a series of Ti-X-N and Cr-X-N films were prepared under the various N2 partial pressures，bias voltages and substrate temperatures by reactive magnetron sputtering using the mosaic target and multi-targets systems. The composition, microstructure, mechanical properties and thermal stability of the films were investigated using EDS, XRD, XPS, AFM, nano-indentation, scratch and thermal stability test. The results indicated that the doping element content, microstructure and mechanical properties of the films can be easily regulated through the deposition parameters, such as the N2 partial pressure，bias voltages and so on. The superhard Ti-Si-N and Ti-Al-N films with the nanohardness of more than 40GPa can be achieved, especially when the lower N2 partial pressure is used.

• Periodical: Key Engineering Materials (Volume 479)
• Pages: 90-97
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.479.90
• Online since: April 2011
• Authors: Tao Zhou, Pu Lin Nie, Xun Cai
• Keywords: Doping, Magnetron Sputtering, Mechanical Property, N₂ partial pressure, Substrate Bias Voltage

References

[1] Martin P J, Bendavid A, Cairney J M. et al. Nanocomposite Ti-Si-N, Zr-Si-N, Ti-Al-Si-N, Ti-Al-V-Si-N thin film coatings deposited by vacuum arc deposition [J]. Surf Coat Technol. 2005, 200: 2228-2235.

DOI: 10.1016/j.surfcoat.2004.06.012

[2] Ramana J V, Kumar S, David C, et al. Structure, composition and microhardness of (Ti, Zr)N and (Ti, Al)N coatings prepared by DC magnetron sputtering [J]. Mater Lett. 2004, 58: 2553-2558.

DOI: 10.1016/j.matlet.2004.03.020

[3] Lee K H, Park C H, Yoon Y S, et al. Structure and properties of (Ti1-xCrx)N coatings produced by the ion plating method [J]. Thin Solid Films. 2001, 385: 167-173.

DOI: 10.1016/s0040-6090(00)01911-8

[4] S. Veprek, S. Reiprich. A concept for the design of novel superhard coatings. Thin Solid Films, 268 (1995): 64-71.

DOI: 10.1016/0040-6090(95)06695-0

[5] M. Diserens, J. Patscheider, F. Levy. Improving the properties of titanium nitride by incorporation of silicon. SURFACE & COATINGS TECHNOLOGY, 109 (1998): 241-246.

DOI: 10.1016/s0257-8972(98)00560-x

[6] X. Ding, X. Zeng, Y. Liu, et al. Structure and mechanical properties of Ti-Si-N films deposited by combined DC/RF reactive unbalanced magnetron sputtering. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 22 (2004): 2351-2355.

DOI: 10.1116/1.1798771

[7] Zhang C.H., Liu Z.J., et al., Microstructure, surface morphology, and mechanical properties of nanocrystalline TiN/amorphous Si3N4 composite films synthesized by ion beam assisted deposition [J]. Jounal of Applied Phyics, 2004, 95: 1460-1467.

DOI: 10.1063/1.1638611

[8] Yan LiangChen, Xiong XiaoTao, Yang huisheng , etc. Study on the (Ti, Al)N films by reactive magnetron sputtering with double targets [J ]. Journal of Vacuum science and technology. 2005, 25: 233-237.

[9] Xu Ye. Study on the superhard nanocomposite Ti-Si-N films. The academic dissertation of the master of Shanghai Jiao Tong University, (2006).

[10] Zhou Tao, etc. Study on the mechanical property of (Ti, Al) N films by magnetron sputtering, China's surface engineering, 2010, 23( 1): 34-38.

[11] H. P. Klug, L. E. Alexander, X-Ray Diffraction Procedures, Wiley, New York, (1974).