A Biaxial Capacitive Microaccelerometer with a Single Proof-Mass

Yu Liu; Zhi Yu Wen; Li Chen; Xue Feng He; Sheng Qiang Wang

doi:10.4028/www.scientific.net/KEM.483.148

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 483A Biaxial Capacitive Microaccelerometer with a...

A Biaxial Capacitive Microaccelerometer with a Single Proof-Mass

Abstract:

This work focuses on the development of a biaxial fully differential capacitive microaccelerometer with a single proof-mass. Its design, optimization and fabrication are discussed in detail. Structure and geometric parameters are optimized by multidisciplinary design optimization, enabling ±1g operating range, 1182Hz resonant frequency, 97 fF/g sensitivity, 4.1mg resolution and 0.68 damping ratio. Silicon-on-glass (SOG) bulk micromachining and inductively coupled plasma (ICP) etching technologies are adopted to fabricate this accelerometer.

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Periodical:

Key Engineering Materials (Volume 483)

Pages:

148-153

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.483.148

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Online since:

June 2011

Authors:

Yu Liu, Zhi Yu Wen, Li Chen, Xue Feng He, Sheng Qiang Wang

Keywords:

Biaxial Capacitive Sensors, Bulk Silicon Micromachining, MEMS Accelerometer, Microstructure, Multidisciplinary Design Optimization

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