Estimation of Nanometer-Sized EB Patterning Using Energy Deposition Distribution in Monte Carlo Simulation

Abstract:

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We have studied on theoretical electron energy deposition in thin resist layer on Si substrate for electron beam lithography. We made Monte Carlo simulation to calculate the energy distribution and to consider formation of nanometer sized pattern regarding electron energy, resist thickness and resist type. The energy distribution in 100 nm-thick resist on Si substrate were calculated for small pattern. The calculations show that 4 nm-wide pattern will be formed when resist thickness is less than 30 nm. Furthermore, a negative resist is more suitable than positive resist by the estimation of a shape of the energy distribution.

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Periodical:

Edited by:

Osamu Hanaizumi, Masafumi Unno and Kenta Miura

Pages:

127-132

DOI:

10.4028/www.scientific.net/KEM.497.127

Citation:

H. Zhang et al., "Estimation of Nanometer-Sized EB Patterning Using Energy Deposition Distribution in Monte Carlo Simulation", Key Engineering Materials, Vol. 497, pp. 127-132, 2012

Online since:

December 2011

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$35.00

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