Preparation of Titania Solid Films by Laser CVD Using CO2 Laser

Ming Gao; Akihiko Ito; Rong Tu; Takashi Goto

doi:10.4028/www.scientific.net/KEM.508.279

Paper Titles

Proton Dynamics in Water Nanotube of New Molecular Porous Crystal
p.257

Ferromagnetic Resonance Study on FePt Thin Films with In-Plane Magnetization Using Coplanar Waveguide
p.261

Spin Pumping in a Ferromagnetic/Nonmagnetic/Spin-Sink Trilayer Film: Spin Current Termination
p.266

Studies on Properties of Epoxy Resin Base Piezoelectricity Damping Carbon Fiber Composite Materials
p.271

Preparation of Titania Solid Films by Laser CVD Using CO₂ Laser
p.279

Physical Properties of the SiC_xN_yH_z Films
p.283

Microcolumnar and Granular Structures of TiO₂ Films Prepared by Laser CVD Using Nd:YAG Laser
p.287

Ionic Conductivity and Crystal Structure of TM-Doped Mg₀_.₅Ti₂(PO₄)₃ (TM = Fe, Mn, Co and Nb)
p.291

Orientation and Morphology of LiCoO₂ Prepared by Chemical Vapor Deposition on Al₂O₃ Single Crystal
p.300

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Preparation of Titania Solid Films by Laser CVD Using CO₂ Laser

Abstract:

Titania (TiO₂) Films Having Dense and Solid Microstructure Were Prepared by Laser Chemical Vapor Deposition Using CO₂ Laser. The Effects of Deposition Temperature (T_dep) and Total Chamber Pressure (P_tot) on Phase and Microstructure of TiO₂ Films Were Investigated. At P_tot = 600 Pa and T_dep = 790 K, Rutile TiO₂ Film Had a Polygonal Platelet Grains 2 μm in Size. At P_tot = 600 Pa and T_dep = 1010 K, Rutile TiO₂ Film Had (110) Orientation and Consisted of a Truncated Polyhedron 5–6 μm in Size. At P_tot = 200 Pa and T_dep = 955 K, Rutile TiO₂ Film Has a Solid Columnar Having Faceted Surface. A Dense and Solid TiO₂ Film Was Obtained at P_tot = 200 Pa and T_dep = 1120 K. The Deposition Rate of TiO₂ Solid Film Was Reached 240 μm h⁻¹.