Fabrication of PDMS Nano-Stamp by Replicating Si Nano-Moulds Fabricated by Interference Lithography

Abstract:

In this research, a polydimethylsiloxane nanostamp for nanocontact printing was fabricated by replicating Si nanomoulds. Si moulds of various shapes and sizes were fabricated by interference lithography and deep reactive ion etching. As an anti-adhesion layer, octadecyltrichlorosilane was treated on Si nanomoulds. Further, superhydrophobic surfaces were obtained by self-assembled monolayer treatment on Si nanostructures.

• Periodical: Key Engineering Materials (Volume 516)
• Pages: 25-29
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.516.25
• Online since: June 2012
• Authors: Ikjoo Byun, Jong Ho Park, Joon Won Kim, Beom Joon Kim
• Keywords: Interference Lithography (IL), Nanocontact Printing (nCP), Self-Assembled Monolayer (SAM), Superhydrophobic Surface

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