Reaction Kinetic in the CVD Process of Pyrocarbon Deposition from Propylene Pyrolysis

Abstract:

The deposition rate(r) of pyrocarbon deposited from propylene pyrolysis has been explored as a function of residence time (tr=0.2-5s) and deposition temperature (T=1173-1333K) at a constant pressure of 6 kPa. The main feature of r vs. curves was that the deposition rate, firstly increase and then decrease with the residence time. A qualitative chemical model was developed and the kinetic domains were defined for the formation of pyrocarbon. The model could explain the change of deposition rates and kinetic transition due to the occurrence of two different families of ultimate carbon precursor.

• Periodical: Key Engineering Materials (Volume 519)
• Pages: 193-196
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.519.193
• Online since: July 2012
• Authors: Cui Ying Lu, Lai Fei Cheng, Li Tong Zhang, Chun Nian Zhao
• Keywords: Chemical Model, Chemical Vapor Deposition (CVD), Kinetic Domains, Pyrocarbon, Reaction Kinetics

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