A Review on Fabrication Methods of BiFeO₃ Thin Films

Abstract:

BiFeO₃ is a very promising multiferroic materials, which can present ferroelectric and antiferromagnetic properties at room temperature (T_n=643 K, T_c= 1103 K). Because the fabrication methods of BiFeO₃ films play a significant role on their properties, various processing techniques have been developed in recent years for the preparation of such films. In this paper, the main fabrication processes on BiFeO₃ thin films were reviewed, including two important chemical processes, chemical solution deposition and metal-organic chemical vapor deposition, and two commonly applied physical processes, pulsed laser deposition and radio-frequency magnetron sputtering.

• Periodical: Key Engineering Materials (Volume 544)
• Pages: 81-86
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.544.81
• Online since: March 2013
• Authors: Yao Ting Huang, Xiu Li Fu, Xiao Hong Zhao, Wei Hua Tang
• Keywords: BiFeO₃, Fabrication, Thin Film

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