Texturing Multi-Crystalline Silicon Wafer by Ultrasonic Standing Wave in Acid Etching

Abstract:

As a renewable, clear and inexhaustible energy, solar energy receives much more attention and has partly substituted traditional energies in many fields. Multi-crystalline silicon plays an important role for its low cost, abundant reserves and excellent photoelectric conversion in solar cells. Mixed acid etching is an effectively method to texture the morphology on the surface of mc-Si, While stochastic etching between silicon and acids results in irregular texturing and high reflectivity. In this paper, ultrasonic standing wave is introduced into acid solution, which aid wet etching to texture on the surface of mc-Si by controlling distribution of atoms of acids. Scanning electron microscope experiment shows that the morphology on the surface of mc-Si textured by this method is similar to that of mono-crystalline silicon. And the average reflectivity is 8%, much lower than mixed acid etching.

• Periodical: Key Engineering Materials (Volumes 562-565)
• Pages: 781-784
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.562-565.781
• Online since: July 2013
• Authors: Yan Chao, Li Qun Wu
• Keywords: Micro/Nanomorphology, Multi-Crystalline Silicon (mc-Si), Reflectivity, Texturing, Ultrasonic Standing Wave

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