The Homogeneous Design of Large Area Film Hollow Cathode Plasma Graft Polymerization

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Abstract:

CRFHCP RF hollow cathode plasma graft polymerization has characteristics of discharge density, high discharging efficiency, good surface modification effect, discharge area and regional separation, applies to modify large area thin film material surface. The uniformity modifying large area plasma material surface is the technical difficulty related technical personnel has been concerned with, the key point restricting HCRFCP technology industrialization application too. This paper analyzes influence factors of the large area thin film materials plasma graft polymerization uniformity; applies simulation software and mathematical models; makes optimized design to the hollow cathode discharge electrodes and graft polymerization distributing pipe. The experiment proved, the uniformity processing large area battery diaphragm is better to apply the hollow cathode plasma graft polymerization, and is suitable for industrial application.

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45-51

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July 2013

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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[1] D. Korzec, J. Engemann. Multi-jet hollow cathode discharge for remote polymer deposition. Surface and Coatings Technology. 93 (1997)128~133.

DOI: 10.1016/s0257-8972(97)00022-4

Google Scholar

[2] L. Bardos. Radio frequency hollow cathodes for the plasma processing technology. Surface and Technology. 86-87 (1996)648~656.

DOI: 10.1016/s0257-8972(96)03056-3

Google Scholar

[3] H. Barankova, L. bardos. Hollow cathode cold atmospheric plasma source with monoatomic and molecular gases. Surface and Coatings Technology. 163-164 (2003)649~653.

DOI: 10.1016/s0257-8972(02)00688-6

Google Scholar

[4] Michael A. Lieberman, of Allen. J. Lidengboge. Plasma discharge principle and material processing, Science Press, Beijing, (2007).

Google Scholar

[5] M. Naddaf, S. Saloum, B. Alkhaled. Atomic oxygen in remote plasma of radio-frequency hollow cathode discharge source. Vaccum. 8(2010)4–12.

DOI: 10.1016/j.vacuum.2010.08.004

Google Scholar

[6] H.S. Zhen, Plasma processing technology, Tsinghua University Press, Beijing, (1990).

Google Scholar

[7] S.J. Huang, etc, Plasma chemical vapor deposition cloth gas device design. Guangdong Non-Ferrous Metal Journal. 5 (2002) 21-24. 抱歉,系统响应超时,请稍后再试 · 支持中英、中日在线互译 · 支持网页翻译,在输入框输入网页地址即可 · 提供一键清空、复制功能、支持双语对照查看,使您体验更加流畅.

Google Scholar