TEM Analysis of the Nanostructure of Pb(Mg1/3Nb2/3)O3 Thin Films by MOD Method

Yoshihiro Misaka; Takanori Kiguchi; Kazuhisa Sato; T. Nishimatsu; Tomoaki Yamada; N. Usami; Toyohiko J. Konno

doi:10.4028/www.scientific.net/KEM.582.19

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 582TEM Analysis of the Nanostructure of...

TEM Analysis of the Nanostructure of Pb(Mg_1/3Nb_2/3)O₃ Thin Films by MOD Method

Abstract:

Pb (Mg_1/3Nb_2/3)O₃ (PMN) thin films were prepared by metal organic decomposition (MOD) method. The effects of Pb content and annealing temperature on the crystallinity of PMN epitaxial thin films were investigated. The 10at% Pb-excess PMN film annealed at 973 K with facing the film surface against another STO substrate have improved its crystallinity compared with those under another conditions.

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Periodical:

Key Engineering Materials (Volume 582)

Pages:

19-22

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.582.19

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Online since:

September 2013

Authors:

Yoshihiro Misaka, Takanori Kiguchi, Kazuhisa Sato, T. Nishimatsu, Tomoaki Yamada, N. Usami, Toyohiko J. Konno

Keywords:

Epitaxial Growth, MOD, Pb(Mg_1/3Nb_2/3)O₃, Relaxor, TEM, Thin Film

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