Photo-Reflective Layer on Low Temperature Co-Fired Ceramic for Optical Applications

Martin Klíma; Milan Holik; Vojtech Svatos; Jaromir Hubálek; Ivan Szendiuch; Frantisek Urban

doi:10.4028/www.scientific.net/KEM.592-593.457

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Photo-Reflective Layer on Low Temperature Co-Fired Ceramic for Optical Applications
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HomeKey Engineering MaterialsKey Engineering Materials Vols. 592-593Photo-Reflective Layer on Low Temperature Co-Fired...

Photo-Reflective Layer on Low Temperature Co-Fired Ceramic for Optical Applications

Abstract:

The article deals with photo-reflective layer on Low Temperature Co-fired Ceramic substrate deposition. Measurement of diffusion and specular reflectance and roughness of layer is included. Fabrication process and its optimization is also mentioned. For measurement of deposited layer optical properties, spectrometric method in spherical chamber was used. Further, profile of layers surface was measured by profilometer to acquire dependence between roughness and reflectivity. The main aim of work is to map the possibility of creation of photo-reflective layer on electrical, chemical and thermal resistant substrate in simple way.

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Periodical:

Key Engineering Materials (Volumes 592-593)

Pages:

457-460

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.592-593.457

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Online since:

November 2013

Authors:

Martin Klíma, Milan Holik, Vojtech Svatos, Jaromir Hubálek, Ivan Szendiuch, Frantisek Urban

Keywords:

Diffusion Reflectance, LTCC, Roughness, Specular Reflectance, Surface, Thick-Film, Thin Film

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