The Fabrication of Codoped ZnO Thin Films by DC Magnetron Sputtering

Abstract:

The codoped ZnO thin film were deposited by DC magnetron sputtering on silicon (111) followed by annealing treatment at 400 °C and 600 °C for 1 hour in nitrogen and oxygen gas mixture. Structural investigation was carried out by scanning electron microscopy (SEM) and X ray diffraction (XRD). Film roughness (r.m.s) and grain shape were found to be correlated with the annealing temperatures. SEM result has shown that its surface characteristics are strongly influenced by annealing temperatures.

• Periodical: Key Engineering Materials (Volumes 594-595)
• Pages: 958-961
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.594-595.958
• Online since: December 2013
• Authors: Haslinda Abdul Hamid, Hooi Min Yee, Mohd Nasir Abdul Hadi
• Keywords: Codoped, DC Magnetron Sputtering, Undoped, Zinc Oxide (ZnO)

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