Design and Fabrication of Mult-Wave Band Yellow Laser Filter Film

Dong Mei Liu; Shuai Wang; Xiu Hua Fu; Jing Zhang; Yang Kou

doi:10.4028/www.scientific.net/KEM.609-610.100

Paper Titles

ZnO/Graphene Composites: Synthesis, Characterization and Optical Properties
p.76

The Study of SiC Thin Films Produced by Magnetron Sputtering
p.82

Surface Modification of Nano-Titanium and its Effect on the Antibacterial Property of Waterborne Wood Coating
p.88

Design and Deposition of Infrared Antireflection Protection Film on Magnesium Fluoride Substrate for 3~5 μm
p.94

Design and Fabrication of Mult-Wave Band Yellow Laser Filter Film
p.100

Design and Evaluation of a High-Accuracy Measurement System for Sheet Resistance of Thin Films
p.106

Optical and Electrical Properties of P-Type N-Doped ZnO Film
p.113

Performance of Wood Flooring UV Coatings Interfacial Modified by Nano-Silica
p.118

Effect of RuO₂ on Piezoresistive Properties of CB/MVQ Composite Materials
p.124

HomeKey Engineering MaterialsKey Engineering Materials Vols. 609-610Design and Fabrication of Mult-Wave Band Yellow...

Design and Fabrication of Mult-Wave Band Yellow Laser Filter Film

Abstract:

In recent years, yellow laser has the broad application in military, civil use, health care and so on, so it is important to study the cavity facet film in yellow laser. In this paper, the substrate is Nd:YVO₄，Ta₂O₅ and SiO₂ are chosen as the film materials. A accurate film is designed and prepared with the specific refractive at the band of 589nm, 1064nm, 1178nm, 1342nm. The influence of thickness monitoring error on the measured spectral curve is analyzed. The film thickness control accuracy is improved by optimizing the parameters (for example: temperature, oxygen filling etc.) and adjusting the correction coefficient of sensitive layer. Finally，the influence of error on filter spectral characteristics is reduced. The result shows that the prepared film satisfies the using requirement standard.

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Key Engineering Materials (Volumes 609-610)

Pages:

100-105

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.609-610.100

Citation:

Cite this paper

Online since:

April 2014

Authors:

Dong Mei Liu, Shuai Wang*, Xiu Hua Fu, Jing Zhang, Yang Kou

Keywords:

Correction Coefficient, Laser Damage Threshold, Thin Film, Yellow Laser

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

* - Corresponding Author

References

[1] Li Shutao, All-Solid-State Yellow Laser,D. Jinan: Shandong University, (2008)8～12.

Google Scholar

[2] Sun Jian, Sun Yao, Li Xiaomin, Li Tao, Zhang Shuaiyi, Yu Guolei, Zhuo Zhuang, Comparison and research of Nd: GdYVO4 and Nd: YVO4 laser's characteristics,J. (2007)11-17.

Google Scholar

[3] Fu Xiuhua, Huang Jinglong, Mo Zhaoyan, Wang Yun, Design and fabrication of 589nm laser optical path integration system filter film , J. Chinese J. Lasers, (2013)0307001.

DOI: 10.3788/cjl201340.0307001

Google Scholar

[4] Xu Cheng, Dong Hongcheng, Xiao Qiling, Ma Jianyong, Jin Yunxia, Shao Jianda, Optical properties and laser-induced damagethreshold of Ta2O5 films deposited by different methods,J. Chinese J. Lasers, 2008, 35(10), 1595～(1999).

DOI: 10.3788/cjl20083510.1595

Google Scholar

[5] Wang Congjuan, Jin Yunxia, Wang Yingjian, Shao Jianda, Fan Zhengxiu. High laser-induced damage threshold antireflection coatings of 1053nm deposited by ion assisted deposition,J. Chinese J. Lasers, 2006, 33(5), 0683～0686.

Google Scholar

[6] Tang Jinfa, Gu Peifu, Liu Xu et al . Modern optical thin film , M. Hangzhou: Zhejiang University Press, 2006, pp.261-261.

Google Scholar