Deposition and Characterization of Mg Doped CuCrO₂ Films by DC Magnetron Sputtering

Abstract:

Single-phase delafossite type Mg-doped copper-chromium oxide thin films were prepared on c-sapphire, quartz glass and n-Si substrates by direct current (DC) magnetron sputtering using a CuCr_0.97Mg_0.03O₂ (CCMO) ceramic target, followed by post annealing at 800 °C in a nitrogen atmosphere. X-ray diffraction (XRD) revealed that the film deposited on c-plane sapphire was highly c-axis oriented, while the films on quartz glass and Si only showed weak (0 1 2) peak. The transparencies of the films on c-sapphire and quartz glass were over 60 % in the visible light region and the direct bandgap of both films were estimated to be 3.16 eV. The in-plane resistivities were 0.24 Ωcm and 7.68 Ωcm for the crystallized films on c-sapphire and quartz glass, respectively. The electrical property of the formed CCMO/n-Si junction was found to be rectifying with a ratio of ~15 at ±2 V.

• Periodical: Key Engineering Materials (Volumes 609-610)
• Pages: 255-259
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.609-610.255
• Online since: April 2014
• Authors: Su Zhen Wu, Zan Hong Deng, Wei Wei Dong, Jing Zhen Shao, Xiao Dong Fang*
• Keywords: Delafossite, Mg Doped CuCrO₂, P-Type Semiconducting Oxide, Sputtering

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