Effect of Annealing Temperature on Structure and Mechanical Property of Magnetron Sputtered c-BN Films

Jie Lin Xiao; Chuan Bin Wang; Xiao Shuang Luo; Lian Meng Zhang

doi:10.4028/www.scientific.net/KEM.616.104

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 616Effect of Annealing Temperature on Structure and...

Effect of Annealing Temperature on Structure and Mechanical Property of Magnetron Sputtered c-BN Films

Abstract:

c-BN films were deposited on Si (100) substrates by magnetron sputtering followed by annealing at high temperatures. The effect of annealing temperature on the structure, surface morphology and mechanical property of the films were investigated. The structural characterization by FTIR showed an increasing in c-BN content with annealing temperature, and the surface morphology of the c-BN films became more homogeneous. The stress produced in the films was relaxed after annealing, and the hardness was increased with the increasing of c-BN content. At the optimum annealing temperature of 900°C, the hardness reached the maximum value of 13.32 GPa, where the films had the highest c-BN content of 64.3%.

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Periodical:

Key Engineering Materials (Volume 616)

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104-107

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https://doi.org/10.4028/www.scientific.net/KEM.616.104

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Online since:

June 2014

Authors:

Jie Lin Xiao, Chuan Bin Wang*, Xiao Shuang Luo, Lian Meng Zhang

Keywords:

Annealing Temperature, c-BN Film, Hardness, Magnetron Sputtering

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