Simulation and Test of through Silicon Vias Impacted by Large Current Pulse

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Abstract:

The failure mechanism of through silicon vias impacted by large current pulse is reported. A theoretical model has been built to describe how TSVs fails when impacted by large current pulse. The theoretical model is then solved by applying COMSOL Multiphysics and the weak points of the TSV have been pointed out. By applying the large current pulse generating and testing system, an experiment has been done to verify the theoretical model. The results show that although the TSVs may be broken down when impacted by large current pulse, it can still be function by using several TSVs in parallel.

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Key Engineering Materials (Volumes 645-646)

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190-194

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May 2015

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© 2015 Trans Tech Publications Ltd. All Rights Reserved

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[1] Ogawa S, Yuasa T, Fujii Y, et al. Millimeter-wave transmission line with through-silicon via for RF-MEMS devices, IEICE Electronics Express, (2013).

DOI: 10.1587/elex.10.20130565

Google Scholar

[2] Zhao Y, Lou W, Li D. Study of a novel bi-stable and easy integrated MEMS ETBS. 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS), 2012, pp.257-260.

DOI: 10.1109/nems.2012.6196769

Google Scholar

[3] Yoon S W, Yang D W, Koo J H, et al. 3D TSV processes and its assembly/packaging technology. 3D System Integration, 2009, pp: 1-5.

DOI: 10.1109/3dic.2009.5306535

Google Scholar

[4] Gong X, Chen J, Lee J H. FEM Simulation of the Thermo-Mechanical Behavior of TSV 3D MEMS Structure. Key Engineering Materials, 2013, pp: 108-113.

DOI: 10.4028/www.scientific.net/kem.562-565.108

Google Scholar

[5] Katti G, Stucchi M, De Meyer K, et al. Electrical modeling and characterization of through silicon via for three-dimensional ICs. IEEE Transactions on Electron Devices, 2010, pp: 256-262.

DOI: 10.1109/ted.2009.2034508

Google Scholar

[6] L.E. Hollander Jr., Semiconductor explosive igniter, US Patent 3366055, Jan. 30, (1969).

Google Scholar

[7] D.A. Benson, M.E. Larsen, A.M. Renfund, W.M. Trott, and R.W. Bickes Jr., Semiconductor bridge: A plasma generator for the ignition of explosives, Journal of Applied Physics, vol. 62, no. 5, pp.1622-1632, May. (1987).

DOI: 10.1063/1.339586

Google Scholar

[8] B.A.M. Tovar, Electrothermal transients in highly doped phosphorous diffused silicon-on-sapphire semiconductor bridge under high current density conditions, PhD dissertation, University of New Mexico, (1993).

Google Scholar

[9] J. U. Kim, C. O. Park, M. I. Park, S.H. Kim, and J. B. Lee, Characteristics of semiconductor bridge (SCB) plasma generated in a micro-electro-mechanical system (MEMS), Physics letters A, vol. 305, no. 6, pp.413-418, (2002).

DOI: 10.1016/s0375-9601(02)01498-6

Google Scholar

[10] T. A. Baginski, and K. A. Thomas, A Robust One-Shot Switch for High Power Pulse Applications, NDIA 52th Annual Fuze Conference, Sparks, NV. (2008).

Google Scholar