[1]
H.M. TONG, LAI Y S, C.P. WONG. Advanced flip chip package. USA, (2013).
Google Scholar
[2]
J. W. Nah, J. O. Suh, K, W. Paik. Effects of current density on electromigration-induced failure in flip chip composite solder joints at room temperature. IEEE Advanced Packaging Materials: Processes, Properties and Interfaces. (2005)50-53.
DOI: 10.1109/isapm.2005.1432044
Google Scholar
[3]
Y. M. Lin, C. J. Zhan, J. Y. Juang. Electromigration in Ni/Sn Intermetallic Micro Bump Joint for 3D IC Chip Stacking. Electronic Components and Technology Conference, Lake Buena Vista, (2011)351-357.
DOI: 10.1109/ectc.2011.5898537
Google Scholar
[4]
M.H. Lu, R. Rosenberg. Electromigration kinetics and critical current of Pb-free interconnects. Applied Physics Letters, ( 2014).
DOI: 10.1063/1.4870833
Google Scholar
[5]
Y.C. Chan, D. Yang. Failure mechanisms of solder interconnects under current stressing in advanced electronic packages . Progress in Materials Science. (2010)428-475.
DOI: 10.1016/j.pmatsci.2010.01.001
Google Scholar
[6]
C. Chen, H. M. Tong, and K. N. Tu. Electromigration and Thermomigraion in Pb-Free Flip-Chip Solder Joints. Annual Review of Materials Research, (2010)531-555.
DOI: 10.1146/annurev.matsci.38.060407.130253
Google Scholar
[7]
B. Buszewski, E. Dziubakiewicz, M. Szumski. Electromigration Techniques. Springer, (2013).
Google Scholar
[8]
S. H. Chiu, S. W. Liang and C. Chen. Joule Heating Effect under Accelerated Electromigration in Flip-chip Solder Joints. Electronic Components and Technology Conference, San Diego, CA, (2006).
DOI: 10.1109/ectc.2006.1645721
Google Scholar
[8]
W.J. Choi, E.C.C. Yeh, K.N. Tu. Mean-time-to-failure of flip chip solder joints on Cu/Ni(V)/Al thin-film under-bump-metallization. Journal of Applied Physics, 94 (2003)5665-5671.
DOI: 10.1063/1.1616993
Google Scholar
[9]
K.N. Chiang, C.C. Lee, K.M. Chen. Current crowding-induced electromigration in SnAg3. 0Cu0. 5 microbumps. Applied Physics Letters, 88 (2006)072102-1-3.
DOI: 10.1063/1.2173710
Google Scholar
[10]
S.W. Liang, T.L. Shao, and C. Chen. 3-D Simulation on Current Density Distribution in Flip-Chip Solder Joints with Thick Cu UBM under Current Stressing. Electronic Components and Technology Conference, Lake Buena Vista, (2005).
DOI: 10.1109/ectc.2005.1441971
Google Scholar
[11]
Y. S. Lai, C.L. Kao. Characteristics of current crowding in flip-chip solder bumps. Microelectronics Reliability, (2006) 915-922.
DOI: 10.1016/j.microrel.2005.02.007
Google Scholar