Fabrication of Ultrasmooth Polymer Films by Concentration Control and Spin Speed Adjustment

Abstract:

In order to obtain ultrasmooth polymer films, in combination with sacrificial layer a variety of impending structures in MEMS devices can be easily prepared. Two methods using polymer concentration control and spin speed adjustment to planarize polymer surface are presented. The influence of polymer concentration and spin speed on the effect of photoresist planarization is studied on. Through a large number of experiments, optimized process parameters are collected. It is found that the roughness was reduced effectively when the spin high speed was 5000rpm for 50 seconds under the condition of volume dilution ratio of 1:5. This process is able to produce a smooth surface structure.

• Periodical: Key Engineering Materials (Volumes 645-646)
• Pages: 330-334
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.645-646.330
• Online since: May 2015
• Authors: Yan Guo, Wei Guo Liu*, Huan Liu, Shun Zhou, Lei Wu, Fei Li
• Keywords: Planarization, Sacrificial Layer, Surface Roughness

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