Research of Thin Film for Laser Polarization Beam Splitter

Abstract:

Based on the design theory of film stack,H4 and SiO2 were selected as the high and low refractive index materials respectively. Through optimization by Macleod and TFCalc software, plus considering the internal electric field intensity distribution of film and laser induced damage threshold as well,the beam-splitting film with Tp=65±5% and Ts=30±5% in the 600-700 band in condition of 45 °± 3 ° incident angle has been achieved. Adopting electron beam ion assisted deposition system to development, the deposition parameters of materials has been optimized via orthogonal matrix experiment. The fabrication of thin film for laser polarization beam splitter has been succeeded. Its optical properties, mechanical properties and resistance to environmental test of the film have been approved to meet all using requirements.

• Periodical: Key Engineering Materials (Volumes 645-646)
• Pages: 381-387
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.645-646.381
• Online since: May 2015
• Authors: Xiu Hua Fu, Yong Gang Pan*, Dong Mei Liu, Jing Zhang, Xiao Juan Wang
• Keywords: Adhesion, Ion Assisted Deposition, Laser Damage Threshold, Polarizing Beam-Splitting Film, Thin Film

References

[1] J.H. Campbell. Status of the National Ignition Facility: an optics perspective. in Optical Interference Coating，OSA Technical Digest Series, 2004, paperWF1.

[2] Wang Ying. Study and preparation of mid-infrared laser films[D]. Zhejiang University.

[3] X. Ya,Q. Liu,M. Gong et al. High-repetition-rate high-beam-quality 43 W ultraviolet laser with extra-cavity thirdharmonicgeneration[J]. Appl. Phys. B, 2009, 95(2): 323～328.

DOI: 10.1007/s00340-009-3368-4

[4] B. Li,J. Yao,X. Ding et al. High efficiency generation of 355 nm radiation by extra-cavity frequency conversion[J]. Opt. Commun., 2010, 283(18): 3497～3499.

DOI: 10.1016/j.optcom.2010.05.008

[5] Hong DongMei, Yue Wei, Research of optical film for middle infrared lasers[J]. Laser and Infrared, 2006, 36(12)1157~1159.

[6] Zhong Disheng. Vacuum Coating [M]. Shenyang: Liaoning University Press, 2001. 181~191.

[7] Liu Chunling, Wang Chunwu, Wang Guangde et al. Process investigation of H4 thin film prepared by electron beam evaporation and application on laser diodes cavity coating [J]. Chinese J. Laser, 2010, 37(12): 3141~3144.

DOI: 10.3788/cjl20103712.3140

[8] Tang Jinfa , Gupeifu, Liu Xu et al . Modern Optical Thin Film Technology[M]. Hangzhou: Zhejiang University Press, 2006. 43~48, 338~343.

[9] Zhong Disheng. Vacuum Coating [M]. Shenyang: Liaoning University Press, 2001. 278~288.

[10] Yang Yongliang, Fu Xiuhua, Liu Guojun et al . Study and Fabrication of Multi-Wavelength Laser Antireflection Film Using New Mixed Material[J]. Chinese J. Laser. 201138(10): 1007002-1-1007002-6.

DOI: 10.3788/cjl201138.1007002

[11] Wang Li, Cheng Xinbin, Wang Zhanshan et al . . Ion-assisted deposition technique[J]. Infared and laser engineering 2007 36 （6）896~898.

[12] Kaufman HR, Robinson R S.J. VAC. Sci. Tecnol. A5(4)Jul/Aug. 1987: 2081-(2084).

[13] Kaufman H R. AIAA J. V23 N1, 1985, 1: 78-87 679-68.

[14] Pan Yonggang，Liu Dongmei，Zhang Jing et al . . Research of three-wave-band filters used in free space communication system[J]. Laser&optoelectroninc Progress，2012, 49: 013101-1~013101-6.

DOI: 10.3788/lop49.013101

[15] Anton R, Hagedorn H, Schnel lbugel A. Ion—assisted deposition of high quality [J]．Thorium free anti—reflection coatings, 1994, 10(2): 288-296.