Influence of Process Parameters on the Properties of TiO₂ Films Deposited by a D.C. Magnetron Sputtering System on Glass Support

Abstract:

In this paper it has been deposited films of titanium oxide (TiO₂), on a support of glass, by a D.C. magnetron sputtering system, by varying the working pressure (p = 2∙10^-3 - 6.5∙10^-3mbar) of the substrate temperature on three levels. The obtained layers were investigated and characterized by optical microscopy, Scanning Electron Microscopy SEM, X-ray diffraction and Atomic Force Microscopy. It was observed that, by modifying technological parameters of the process (working pressure and substrate temperature) it is changing the initial orientation of the compounds ((100) turns into (101) or (002)). The AFM analysis has allowed the observation of the fact that the average roughness of deposited films, expressed as RMS, has increased over 98% at the increasing of sputtering pressure from 2 10^-3mbar to 6.5 10^-3mbar. SEM analysis showed that the density of the deposit increases with substrate temperature. The granulation of the films obtained, presents an increasing trend with the variation of process parameters.

• Periodical: Key Engineering Materials (Volume 660)
• Pages: 86-92
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.660.86
• Online since: August 2015
• Authors: Stefan Lucian Toma, Costica Bejinariu, Eva Lucian, Ioan Gabriel Sandu, Bogdan Florin Toma*
• Keywords: DC Magnetron Sputtering, Titanium Oxide

References

[1] A.A. Akl, H. Kamal, and K. Abdel-Hady, Fabrication and Characterization of Sputtered Titanium DioxideFilms, Applied Surface Science, 252 (2006) 8651-8656.

DOI: 10.1016/j.apsusc.2005.12.001

[2] W. Yang and C. A. Wolden, Plasma-Enhanced Chemical Vapor Deposition of TiO2 Thin Films for Dielectric Applications, Thin Solid Films, 515(2006) 1708 -1713.

DOI: 10.1016/j.tsf.2006.06.010

[3] Y.M. Sung and H. J. Kim, Sputter Deposition and Surface Treatment of TiO2 Films for Dye-Sensitized SolarCells Using Reactive RF Plasma, Thin Solid Films, 515 (2007) 4996 - 4999.

DOI: 10.1016/j.tsf.2006.10.079

[4] S.B. Amor, G. Baud, M. Jacquet, and N. Pichon, Photoprotective Titania Coatings on PET Substrates, Surface and Coatings Technology, 102 (1998) 63-72.

DOI: 10.1016/s0257-8972(97)00558-6

[5] A. Karuppasamy and A. Subrahmanyam, Studies on the Room Temperature Growth of Nanoanatase Phase TiO2Thin Films by Pulsed DC Magnetron With Oxygen as Sputter Gas, Journal of Applied Physics, 101 (2007).

DOI: 10.1063/1.2714770

[6] S.L. Toma, M. Badescu, I. Ionita, M. Ciocoiu and L. Eva, Influence of the Spraying Distance and Jet Temperature on the Porosity and Adhesion of the Ti Depositions, Obtained by Thermal Spraying in Electric Arc - Thermal Activated, Applied Mechanics and Materials, 657 (2014).

DOI: 10.4028/www.scientific.net/amm.657.296

[7] M. Jerman, D. Mergel, Structural Investigation of Thin TiO2 Films Prepared by Evaporation and Post- Heating, Thin Solid Films, 515(2007) 6904 -6908.

DOI: 10.1016/j.tsf.2007.01.038

[8] C.J. Tavares, J. Vieira, L. Rebouta, G. Hungerford, P. Coutinho, V. Teixeira, J. O. Carneiro, A.J. Fernandes, Reactive Sputtering Deposition of Photocatalytic TiO2 Thin Films on Glass Substrates, Materials Science and Engineering: B, 138 (2007).

DOI: 10.1016/j.mseb.2005.11.043

[9] V. Nedeff, E. Mosnegutu, M. Panainte, M. Ristea, St. Toma, M. Agop, Dynamics in the boundary layer of a flat particle, Powder Technology, 221 (2012) 312–317.

DOI: 10.1016/j.powtec.2012.01.019

[10] C.H. Heo, S.B. Lee, J.H. Boo, Deposition of TiO2 Thin Films Using RF Magnetron Sputtering Method and Study of Their Surface Characteristics, Thin Solid Films, 475 (2005) 183 -188.

DOI: 10.1016/j.tsf.2004.08.033

[11] S.L. Toma, The influence of jet gas temperature on the characteristics of steel coating obtained by wire arc spraying, Surf & Coat. Technol. 220 (2013) 261–265.

DOI: 10.1016/j.surfcoat.2012.12.006

[12] Ş. A. Irimiciuc, M. Agop, P. Nica, S. Gurlui, D. Mihaileanu, St. Toma, C. Focsa, Dispersive effects in laser ablation plasmas, Jpn. J. Appl. Phys. (2014) 53.

DOI: 10.7567/jjap.53.116202

[13] Z. Wang, U. Helmersson, and P. O. Käll, Optical Properties of Anatase TiO2 Thin Films Prepared by AqueousSol–Gel Process at Low Temperature, Thin Solid Films, 405(2002), pp.50-54. (064318).

DOI: 10.1016/s0040-6090(01)01767-9

[14] Y. Q. Hou, D. M. Zhuang, G. Zhang, M. Zhao, and M. S. Wu, Influence of Annealing Temperature on the Properties of Titanium Oxide Thin Film, Applied Surface Science, 218 (2003) 98-106.

DOI: 10.1016/s0169-4332(03)00569-5

[15] M.H. Suhail, G. Mohan, S. Mohan. DC reactive magnetron sputtering of Titanium-Structural and optical characterization of titania films J. Appl. Phys., 7(3) (1992) 1421-1427.

DOI: 10.1063/1.351264

[16] M. Poiana, M. Dobromir, A.V. Sandu, V. Georgescu, Investigation of Structural, Magnetic and Magnetotransport Properties of Electrodeposited Co-TiO2 Nanocomposite Films, J. Supercond. Nov. Magnetism, 25 (2012) 2377-2387.

DOI: 10.1007/s10948-012-1612-3

[17] A. Shibata, K. Okimura, Y. Yamamoto and K. Matubara, Effect of heating probe on reactively sputtered TiO2 film growth. Jpn. J. Appl. Phys, (1993).

DOI: 10.1143/jjap.32.5666