Influence of Substrate Temperature on Deposition Rate and Optical Properties of Aluminum Oxide Thin Films Prepared by Reactive DC Sputtering Technique

Abstract:

Aluminum oxide films were grown on (100) silicon wafers and glass substrates by pulsed dc reactive magnetron sputtering deposition. In this experiment, substrate temperatures were varied from room temperature to 500°C. Grazing-incidence X-ray diffraction (GIXRD) analysis revealed that the resulting films have amorphous structures. Field-emission scanning electron microscope (FESEM) was used to characterize the morphology of the films. The films’ optical properties were determined by UV-Vis spectroscopy. The results demonstrated that the deposition rate, the surface roughness and the transmittance spectra of the aluminum oxide films were strongly influenced by the substrate temperature. The deposition rate and the surface roughness of the films were higher at higher substrate temperatures. In the range between 100°C and 200°C, the transmittance spectra were found to be lower than those of the films deposited at other substrate temperatures. This was due to the sub-aluminum oxide condition in the films. The dependence of films’ optical properties on the substrate temperature might result from the change in chemical compositions during the sputtering process.

• Periodical: Key Engineering Materials (Volumes 675-676)
• Pages: 281-284
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.675-676.281
• Online since: January 2016
• Authors: Chatpawee Hom-On, Mati Horprathum, Pitak Eiamchai, Sakson Limwichean, Viyapol Patthanasetakul, Noppadon Nuntawong, Chanunthorn Chananonnawathorn, Napat Triroj, Papot Jaroenapibal*
• Keywords: Al₂O₃ Films, Sputtering, Substrate Temperature

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