The Deposition of Silicon-Carbon Coatings in Plasma Based Nonself-Sustained Arc Discharge with Heated Cathode

Abstract:

Silicon-carbon coatings on silicon substrates were deposited in plasma based nonself-sustained arc discharge with heated cathode by plasma polymerization of silicon organic agent such as polyphenyl methylsiloxane (PPhMS). Silicon-carbon coatings were deposited at PPhMS flow rate of 0.012 ml/min, argon pressure of 0-0.1 Pa, discharge current of 5-8 A, discharge voltage of 130-150 V, and filament current of 68 A. Bipolar pulsed bias voltage was supplied on the substrate during coating deposition. Surface morphology, hardness and elastic modulus of silicon-carbon films were investigated after the deposition. The film surface is very smooth with root-mean-square roughness of 0.579 nm. Maximum hardness of coatings was 11 GPa, and maximum elastic modulus was 142 GPa.

• Periodical: Key Engineering Materials (Volume 685)
• Pages: 643-647
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.685.643
• Online since: February 2016
• Authors: A.S. Grenadyorov, K.V. Oskomov, Andrey A. Solovyev, S.V. Rabotkin, N.F. Kovsharov
• Keywords: Diamond-Like Carbon, Polyphenyl Methylsiloxane, Silicon-Carbon Films

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