Technological Features of the Thick Tin Film Deposition by with Magnetron Sputtering Form Liquid-Phase Target

Mariya Makarova; Konstantin Moiseev; Alexander Nazarenko; Petr A. Luchnikov; Galina Dalskaya; Natalya Katakhova

doi:10.4028/www.scientific.net/KEM.781.8

Paper Titles

Preface

Computer Simulation of Vacancy Clusters Distribution by Depth in Molybdenum Irradiated by Alpha Particles
p.3

Technological Features of the Thick Tin Film Deposition by with Magnetron Sputtering Form Liquid-Phase Target
p.8

Radiation Defects in HCC Materials at Atomic Spatial Level
p.14

Acquiring MIS Structures Based on Bа_0.8Sr_0.2TiО₃Ferroelectric Films and their Properties
p.20

Dose Dependences of the Mechanical Strength of Polymer Materials
p.25

Investigation of Thermal Explosion Formation in Heterogeneous Systems
p.30

Effect of Temperature on the Magnetic Permeability of Hexagonal Ferrites
p.36

Influence of Morphology of the Press Powder Particles and Thermal Annealing on the Structure and Microhardness of Palladium Obtained by Solid-Phase Sintering
p.41

HomeKey Engineering MaterialsKey Engineering Materials Vol. 781Technological Features of the Thick Tin Film...

Technological Features of the Thick Tin Film Deposition by with Magnetron Sputtering Form Liquid-Phase Target

Abstract:

Technological features of obtaining of tin films in a vacuum by liquid-phase target magnetron sputtering were reviewed. With high deposition rate the white color tin coating with amorphous structure is formed on the substrate. X-ray microanalysis of the obtained tin films showed the presence of micro-and nanoparticles of an impurity of the crucible material in the structure of the films. The use of the tantalum crucible with liquid-phase target magnetron sputtering with deposition rate of 3.2 μm / min allows obtaining ultra-pure, continuous, homogeneous tin film on a stationary substrate without impurity material of the crucible.

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Periodical:

Key Engineering Materials (Volume 781)

Pages:

8-13

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.781.8

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Online since:

September 2018

Authors:

Mariya Makarova, Konstantin Moiseev, Alexander Nazarenko, Petr A. Luchnikov*, Galina Dalskaya, Natalya Katakhova

Keywords:

Crucible, Deposition, Impurity Nanoparticles, Liquid-Phase Magnetron, Sputtering, TiN Film

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