Effect of Aspect Ratio on Horizontal Field Magnetoresistance

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This paper studies the aspect ratio (W/L), width (W) per length (L) of semiconductor resistor based on Hall effect current mode for horizontal magnetic field. At low concentration, 1014 cm-3, W/L < 1, the length has direct effect to magnetoresistance. The W/L = 1, the large resistor provides magnetioresistance better than small device. The W/L ˃ 1, the width has inversely proportional to magnetoresistance. The %MR(B) is around 1 % at 0.5 T, 1 mA. The long resistor (W/L < 1) can create ΔR in the order of several kilo ohms and several hundred ohms for short resistor (W/L > 1). The contribution factors ρ (L/W) for high ΔR are low concentration and aspect ratio (W/L < 1). The high %MR(B) is contributed by high current density of short structure (W/L > 1). At high concentration 1017 cm-3, aspect ratio and magnetoresistance are not sensitive to magnetic field because the Hall effect hardly occurs in high concentration material.

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327-334

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July 2019

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© 2019 Trans Tech Publications Ltd. All Rights Reserved

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[1] R. S. Popovic, Hall Effect Devices, 2nd ed., IoP Publishing Ltd., London, (2004).

Google Scholar

[2] C. S. Roumenin, Solid State Magnetic Sensors, Elsevier Science B. V., Amsterdam, (1994).

Google Scholar

[3] E. Ramsden, Hall-Effect Sensors: Theory and Applications,, Elsevier Inc., USA, (2006).

Google Scholar

[4] R. S. Popovic, The Vertical Hall-Effect Device, IEEE Trans. Electron Devices, Vol. EDL-5,No.9, (1984).

Google Scholar

[5] T. Phetchakul, S. Poosawat and A. Poyai, The effect of deviation current to 5-contacts vertical Hall device,, ECTI-CON 2016, 28 Jun-1 Jul, Chieng Mai, Thailand.

DOI: 10.1109/ecticon.2016.7561375

Google Scholar

[6] S. V. Lozanova and C. S, Roumein, Parallel-Field Silicon Hall Effect Microsensors with Minimal Design Complexity,, IEEE Sensors Journal.,vol.9,No.7,(2009).

DOI: 10.1109/jsen.2009.2020240

Google Scholar

[7] Y. Chemthung, T. Phetchakul and A.Poyal"Effect of Horizontal Magnetic Field on Magnetoresistance", ECTI-CON 2018, 18-21 Jul, Chieng Rai, Thailand.

DOI: 10.1109/ecticon.2018.8619933

Google Scholar

[8] S. Li and Y. Fu, 3D TCAD Simulation for Semiconductor Processes, Devices and Optoelectronics,, Springer New York, (2012).

Google Scholar

[9] A. M. Huiser and H. P. Baltes, Numerical modeling of vertical Halleffect devices, IEEE Electron Device Lett., vol. EDL-5, pp.482-484, (1984).

DOI: 10.1109/edl.1984.25996

Google Scholar

[10] TCAD Sentaurus Manual, Synopsys, Version L-2016.03.

Google Scholar

[11] C. K. Maiti, Introduction Technology Computer-Aided Design (TCAD),, Pan Stanford Publishing Pte. Ltd., USA , (2017).

Google Scholar