The Use of the TMA as Stabilizing Reagent for the Li-O System Obtained by Atomic Layer Deposition

Abstract:

Lithium-oxygen thin films were deposited by atomic layer deposition (ALD) on the surface of silicon and stainless-steel using lithium bis (trimethylsilyl) amide (LiHMDS) and different counter-reagents (water, ozone, oxygen plasma). The deposited films were non-stable at storage in the air atmosphere. Results of scanning electron microscopy showed that films show a tendency to crystallization and peeling from the substrate surface. X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectroscopy revealed that films mainly consist of LiOH/Li₂CO₃. Coating the surface of lithium-oxygen films with an aluminum oxide layer using the ALD trimethylaluminum (TMA) and water as precursors did not lead to a significant improvement in stability. Nevertheless, the stable films can be obtained using ALD supercycles consisting of sequential pulsing of LiHMDS-water-TMA-water at 250°C.

• Periodical: Key Engineering Materials (Volume 822)
• Pages: 787-794
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.822.787
• Online since: September 2019
• Authors: Denis Nazarov, Ilya Ezhov, Ilya Mitrofanov, Oleksiy Lyutakov, Maxim Yu. Maximov*
• Keywords: Aluminum, Atomic Layer Deposition, Lithium Oxide, Thin Films

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