Optimization for Current-Enhanced Solid-Phase Deposition of Multi-Layer Graphene with High Crystallinity and Uniformity

Ryutaro Tsuchida; Kazuyoshi Ueno

doi:10.4028/p-FFs9Ck

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Optimization for Current-Enhanced Solid-Phase Deposition of Multi-Layer Graphene with High Crystallinity and Uniformity
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HomeMaterials Science ForumMaterials Science Forum Vol. 1108Optimization for Current-Enhanced Solid-Phase...

Optimization for Current-Enhanced Solid-Phase Deposition of Multi-Layer Graphene with High Crystallinity and Uniformity

Abstract:

Solid-phase deposition (SPD) is a preferable method to fabricate multi-layer graphene (MLG) for device applications since MLG can be deposited directly on substrates without transfer. Previously, we reported that current application during SPD enhances the MLG growth. In this study, we investigated the effects of applied current and heating rate on the crystallinity and uniformity of MLG precipitated from carbon (C) / nickel (Ni) structures. It was found that higher current and slower heating rate lead to improve the MLG crystallinity. Moreover, the uniformity was improved by the optimization of Ni and C thickness which could control the nucleation and growth of MLG during SPD. As a result, a uniform MLG with a high G/D ratio of 5.5 was obtained at a low temperature of 365 °C.

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Periodical:

Materials Science Forum (Volume 1108)

Pages:

45-58

DOI:

https://doi.org/10.4028/p-FFs9Ck

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Online since:

December 2023

Authors:

Ryutaro Tsuchida, Kazuyoshi Ueno*

Keywords:

Current, Heating Rate, Multilayer Graphene, Solid-Phase Deposition, Uniformity

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* - Corresponding Author

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