Nucleation and Grain Growth in Silicon Films Deposited by Thermal Decomposition of Disilane

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 126-128)

Edited by:

Ph. Komninou and A. Rocher

Pages:

431-434

Citation:

A.T. Voutsas and M.K. Hatalis, "Nucleation and Grain Growth in Silicon Films Deposited by Thermal Decomposition of Disilane", Materials Science Forum, Vols. 126-128, pp. 431-434, 1993

Online since:

January 1993

Export:

Price:

$38.00